Nishijima G., Takao T., Kitaguchi H., Maeda H., Yanagisawa Y., Miyoshi Y., Yoshida T., Saito K., Takahashi S., Suetomi Y., Hamada Y.M., Renzhong P.
Takao T., Kato T., Yamaguchi T., Hirayama T., Kitaguchi H., Yamagishi K., Ikuhara Y., Maeda H., Ohki K., Yanagisawa Y., Nagaishi T., Piao R., Ueno T., Yokoe D.
Ключевые слова: HTS, Bi2223, films, defects columnar, irradiation effects, ion irradiation, pinning, fabrication, magnetron sputtering, annealing process, resistive transition, resistivity, temperature dependence, critical caracteristics, Jc/B curves, doping effect, critical current density, angular dependence, pinning force, experimental results
Ключевые слова: LTS, Nb3Al, wires multifilamentary, barriers, fabrication, RHQT-process, strands, design parameters, microstructure, magnetization, critical caracteristics, Jc/B curves
Ключевые слова: LTS, Nb3Al, wires, fabrication, defects, phase formation, grain boundaries, pinning mechanism, microstructure
Higashikawa K., Kiss T., Izumi T., Inoue M., Imamura K., Kitaguchi H., Ibi A., Suzuki T., Uetsuhara D., Onodera Y., Lyu L., TAKASAKI K.
Ключевые слова: HTS, Bi2223, tapes multifilamentary, REBCO, GdBCO, coated conductors, transport currents, thermal stability, comparison, heat loads, overcurrent, critical caracteristics, current-voltage characteristics, flux flow, dissipative properties, numerical analysis, modeling, current sharing, thermal runaway, local distribution, critical current, homogeneity
Hayashi K., Nishijima G., Sato K., Kitaguchi H., Kobayashi S., Yamazaki K., Kikuchi M., Shimoyama J., Takeda S., Nakashima T., Kagiyama T.
Ключевые слова: presentation, HTS, Bi2223, status, Japan, magnets, DI-Bi2223, tapes, critical caracteristics, current-voltage characteristics, thin films, Jc/B curves, mechanical properties, stress effects
Ключевые слова: LTS, Nb3Al, fabrication, RHQT-process, mechanical properties, stress effects, strain effects, critical caracteristics, critical current
Ключевые слова: HTS, Bi2223, films, magnetron sputtering, heat treatment, microstructure
Ключевые слова: HTS, Bi2223, thin films, magnetron sputtering, annealing process, critical caracteristics, substrate SrTiO3, resistive transition, magnetic field dependence, Jc/B curves, upper critical fields, irreversibility fields, critical current, angular dependence, resistivity, MOCVD process, DI-Bi2223, experimental results
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